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GCR4280

4-Axis Horizontal and Multi-Joint Type Clean Robot (For large diameter wafer)

Environment:Clean room atmosphere Arm:Single arm Operating Range:553mm (3rd joint center) Vertical Stroke:300mm / 420mm Payload Capacity:Below 4kg (calculated for the arm 3rd joint)

Product Features

Designed for handling large diameter wafer in a production line or inspection line of semiconductor. Execution of origin search is not required by using the servo motors with absolute encoders.

Product Details

  • 3 FOUP access is available for robot only (for 300mm wafer). 2 FOUP access is available without a track for 450mm wafer.
  • Base or flange mounting type is selectable.
  • Motion monitoring is available.
  • AC servo motors with absolute encoders installed in all axes.
  • High-speed, high-accuracy wafer handling by S-curved speed control and optimizing pass control.
  • Wafer holding: end-effector with vacuum suction, passive edge, or edge grip.
  • End-effector material: CFRP, Al, ceramic, or others.
  • Optimal end-effector is selectable according to the carrying object and line layout.

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