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GTVCR5330
5-axis vacuum horizontal articulated Clean Robot
Environment:Clean room atmosphere (Temp. 15°C to 40°C);Process chamber (Max. Temp. 450°C)
Arm:Single arm
Operating Range:635mm (3rd joint center)
Vertical Stroke:60mm
Payload Capacity:Below 4kg (calculated for the arm 3rd joint)
Product Features
Home 〉Products 〉Robot for Semiconductor 〉GTVCR5330
Robot for Semiconductor
GTVCR53305-Axis Horizontal and Multi-Joint Type Clean Robot
GTVCR5330-060-AM
Product Video
Usage Environment/Specifications
For twin end-effectorsCertified KCs marking
Product Profile
Model Name GTVCR5330
Environment Clean room atmosphere (Temp. 15°C to 40°C)
Process chamber (Max. Temp. 450°C)
Arm Single arm
Operating Range 635mm (3rd joint center)
Vertical Stroke 60mm
Payload Capacity Below 4kg (calculated for the arm 3rd joint)
List of Product Model
Product Model Vertical Stroke
GTVCR5330-060-AM 60mm
The image above and the video are of GTVCR5330-060-AM (*The robot in the image and video uses the four end-effectors.)
Characteristics
Achieved cost reduction while maintaining the performance and functions of conventional robot GTVHR5000 series.
Transfers to the parallel stages in the vacuum chamber and supports various layouts, reducing footprint and vacuuming volume.
Simplification of the chamber layout leads to the cost reduction.
Suitable to the inline layout.
Execution of origin search is not required by using the servo motors with absolute encoders.
Product Details
- Arm lineup: 280mm, 330mm
- Magnetic fluid sealing is used for arm joint.
- Vacuum sealing: Magnetic fluid sealing and bellows are used.
- For cleanliness: 5µm mesh filter installed for exhaust ventilation in the arm.
- Twin end-effector reduces the wafer swap time.
- Motion monitoring is available.
- RS232C and parallel photo I/O are standard for control.
- AC servo motors with absolute encoders installed in all axes.
- High-speed, high-accuracy wafer handlingby S-curved speed control.
- Wafer holding: end-effector with passive edge or edge grip type end-effector, and friction retaining by O-ring.
- End-effector material: CFRP, Al, ceramic, or others.
- Optimal end-effector is selectable according to the carrying object and line layout.
Videos
Links
